Wafer Cleaner 977, 977L
Related Documents
Efficient compact cleaning units to support your process
ADT 977 Wafer Cleaner Systems are designed for cleaning workpieces after dicing.
The systems are offered in two basic configurations :
- WCS-977 – round wafer up to 8"
- WCS-977LA – round wafer up to 12"
System Highlights :
- Atomizing cleaning
- Automatic lid closing
- Intuitive control panel
- Process monitoring
- Compact design
- Robust, vibration-free
- Environmentally friendly
Options:
- CO2 injection
- Ionizer
-
IR Heating
-
Pre-heat surfactant line
-
Tape-less cleaning
-
Special customized solutions
Technical Specifications:
| 977- 200 | 977L - 300 | |
| Max. wafer size | Ø 200 mm | Ø 300 mm |
| Cleaning method | Atomizing cleaning/ High pressure cleaning |
Atomizing cleaning/ High pressure cleaning |
| Number of recipes that can be saved | 20 | 20 |
| Spinner velocity range | 200–3000 rpm | 200–2500 rpm |