Wafer Cleaner 977, 977L
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Efficient compact cleaning units to support your process
ADT 977 Wafer Cleaner Systems are designed for cleaning workpieces after dicing.
The systems are offered in two basic configurations :
- WCS-977 – round wafer up to 8"
- WCS-977LA – round wafer up to 12"
System Highlights :
- Atomizing cleaning
- Automatic lid closing
- Intuitive control panel
- Process monitoring
- Compact design
- Robust, vibration-free
- Environmentally friendly
Options:
- CO2 injection
- Ionizer
-
IR Heating
-
Pre-heat surfactant line
-
Tape-less cleaning
-
Special customized solutions
Technical Specifications:
977- 200 | 977L - 300 | |
Max. wafer size | Ø 200 mm | Ø 300 mm |
Cleaning method | Atomizing cleaning/ High pressure cleaning |
Atomizing cleaning/ High pressure cleaning |
Number of recipes that can be saved | 20 | 20 |
Spinner velocity range | 200–3000 rpm | 200–2500 rpm |