Wafer Cleaner 977, 977L

Wafer Cleaner 977, 977L

Efficient compact cleaning units to support your process

ADT 977 Wafer Cleaner Systems are designed for cleaning workpieces after dicing.

The systems are offered in two basic configurations :

  • WCS-977 –  round wafer up to 8"
  • WCS-977LA   round wafer up to 12" 

System Highlights :

  • Atomizing cleaning
  • Automatic lid closing
  • Intuitive control panel
  • Process monitoring
  • Compact design
  • Robust, vibration-free
  • Environmentally friendly

Options:

  • CO2 injection
  • Ionizer
  • IR Heating
  • Pre-heat surfactant line
  • Tape-less cleaning
  • Special customized solutions
 
 
 
 
 
 
 
Technical Specifications:
  977- 200 977L - 300
Max. wafer size Ø 200 mm Ø 300 mm
Cleaning method Atomizing cleaning/
High pressure cleaning
Atomizing cleaning/
High pressure cleaning
Number of recipes that can be saved 20 20
Spinner velocity range 200–3000 rpm 200–2500 rpm